Applied Microstructures' Molecular Vapor Deposition (MVD^®) technology enables the growth of ultra-thin films with a wide range of functionalities on a broad spectrum of substrates. MVD is a breakthrough proprietary nanotechnology technique that allows for room temperature vapor deposition of several types of organic and organometallic molecules. This innovative technique has facilitated many new emerging applications with small feature sizes that have been difficult or impossible using traditional liquid synthetic techniques. Due to its versatility, MVD is an ideal process for modifying surfaces properties. Films created using MVD can serve as hydrophobic, hydrophilic, biocompatible, protective, or reactive coatings.