REFERENCES:
Many additional technical publications are available. Listed below are some available papers which may be useful for understanding the basics of SAMs (Self Assembled Monolayers) and MVD technology. Please contact us and we'll be glad to answer your questions.
Reference Papers :
MVD Films and Coatings
- M. Grimes and B. Kobrin, “Surface Engineering for Microfabrication”, Solid State Technology, January 2008.
- B. Kobrin, "Surface Engineering Opportunites", Micronanosystems, October 2007.
- B. Kobrin, "Better MEMS, NIL with Surface Engineering" Small Times, November 2007
- C. Carraro, J. Chinn, B. Kobrin, "Exceptional Wear Resistance of MEMS Devices Coated with Carbon-Doped Alumina Films" Transducers 2007
- B. Kobrin, N. Dangaria, J. Chinn "Low Temperature Nanolayers of Metal Oxides by MVD®" NSTI 2007
- B. Kobrin, T. Zhang, M. Grimes, K. Chong, M. Wanebo, J, Chinn, R. Nowak, "An Improved Chemical Resistance and Mechanical Durability of Hydrophobic FDTS Coatings", iMEMS 2006, May 9-12, Singapore.
- B. Kobrin and Jeff Chinn, "Vacuum-base technology for the deposition of self-assembled monolayers (SAMs)", Invited paper: Russian Vacuum Technology Journal, December 2005.
- Boris Kobrin, Jeff Chinn, Robert Ashurst, "Vapor deposition of composite organic/inorganic films", World Tribology Congress, September 2005, Washington D.C.
- B. Kobrin, V. Fuentes, S. Dasaradhi, R. Yi, R. Nowak, J. Chinn, R. Ashurst, C. Carraro, R. Maboudian, "Molecular Vapor Deposition - An Improved Vapor-Phase Deposition Technique for Molecular Coatings for MEMS Devices", Semicon-West 2004, SEMI TEchnical Symposium: Innovations in Semiconductor Manufacturing (STS:ISM), 2004.
- Robert Ashurst, Carlo Carraro, Jeff Chinn, Victor Fuentes, Boris Kobrin, Roya Maboudian, Romuald Nowak, Richard Yi, "Improved vapor-phased deposition technique for anti-stiction monolayers", SPIE 2004, Micromachining and microfabrication, v. 5342, p.p. 204-211.
- W. Robert Ashurst, C. Carraro, R. Maboudian, "Vapor Phase Anti-Stiction Coatings for MEMS", IEEE Transactions on Device and Materials Reliability, Vol. 3, No. 4, December 2003.
- W. Robert Ashurst, Christina Yau, C. Carraro, R. Maboudian, Michael T. Dugger, "Dichlorodimethysilane as an Anti-Sticition Monolayer for MEMS: A Comparison to the Octadecyltrichlorosilane Self-Assembled Monolayer:, Jounal of MicroElectroMechanical Systems, Vol. 10, No. 1, March 2001.
- R. Maboudian, "Surface processes in MEMS technology", Surface Science Reports 30 (1998) 2007-269.
- N. Stoffel, A. Fisher, S. Tan, M. Boysel, "Wafer Level Assembly Methods for Complex Pathway Micro-Fluidic PCR Reactor", Infotonics Technology Center, Canandaigua, NY.
- Anfeng Wang, Jeff Chinn, Xuemei Liang, Ting Cao, Haiying Tang, Steven O. Salley, Gregory W. Auner, K.Y. Simon Ng, "Preparation of Hydrophobic Multilayers on Solid Surfaces", AICHE Annual meeting 2005, Cinncinati, OH.
- Yuchuan Wang, Mauro Ferrari, "Surface modification of micromachined silicon filters", Journal of Materials Science, 35, (2000) 4923-4930.
- T. Zhang, B.Kobrin, M. Wanebo, R. Nowak, R. Yi, J. Chinn, M. Bender, A. Fuchs, "Vapor Deposited Release Layers for Nanoimprint Lithography", SPIE Microlithography, January 2006
- Douglas J. Resnick, David P. Mancini, S.V. Sreenivasan, C.G. Wilson, "Release Layers for Contact and Imprint Lithography", Semicondudctor International, June 2002, p.71.
- T. Bailey, B.J. Choi., M. Coburn, M. Meissl, S. Shaya. J.G. Ekerdt, S.V. Sreenivasan, C.G. Willson, "Step and Flash Imprint Lithography: Template Surface Treatment and Defect Analysis", J. Vac. Sci. Technol. B 18(6), Nov./Dec. 2000 p3572.
- B. Kobrin, W. R. Ashurst, V. Fuentes, R. Nowak, R. Yi and J. Chinn, "Molecular Vapor Deposition for Enhanced Monolayer Stability and Durability", AICHE Annual meeting 2005, November 2, Cinncinati, OH.
- J. Beauvais, A. Zanzal, D. Drouin, E. Lavallee, L.K. Mum, M. Cloutier, T. Glinsner, C. Thanner, H. Luesebrink, M. Wanebo, "Faithful replication? Template-to-Wafer Metrology Comparison for Raised and Recessed Features Using UV-nanoimprint Technology", NanoImprint Congress 2005.
- B. Kobrin, V. Fuentes, S. Dasaradhi, R. Nowak, R. Yi and J. Chinn, W. R. Ashurst, C. Carraro, R. Maboudian, "Molecular Vapor Deposition (MVD) - An Improved Vapor-Phase Deposition Technique of Molecular Coatings for MEMS Devices" Invited Presentation, Semicon-West 2004, SEMI TEchnical Symposium: Innovations in Semiconductor Manufacturing (STS:ISM), 2004.